Fetter, Linus A.: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

Tarascon-Auriol, Regine G., Novembre, Anthony E., Tai, Woon W., Fetter, Linus A., Kometani, Janet M., Nalamasu, Omkaram, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 832 KB

english, 1994

2

Sub-Micron Mesotaxial CoSi2 Wires

Liddle, J. Alex, Zimmerman, Neil M., White, Alice E., Short, Ken T., Fetter, Linus

Journal:

MRS Proceedings

Year:

1992

Language:

english

File:

PDF, 3.13 MB

english, 1992

3

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Mark topography for alignment and registration in projection electron lithography

Farrow, Reginald C., Mkrtchyan, Masis M., Bolen, Kevin, Blakey, Myrtle I., Biddick, Christopher J., Fetter, Linus A., Huggins, Harold A., Tarascon-Auriol, Regine G., Berger, Steven D., Seeger, David E

Year:

1996

Language:

english

File:

PDF, 129 KB

english, 1996

4

SPIE Proceedings [SPIE 14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 14 September 1994)] 14th Annual BACUS Symposium on Photomask Technology and Management - SCALPEL masks

Liddle, James A., Blakey, Myrtle I., Bolan, Kevin J., Farrow, Reginald C., Fetter, Linus A., Hopkins, Leslie C., Huggins, Harold A., Marchman, Herschel M., Peabody, Jr., Milton L., Simpson, Wayne M.,

Year:

1994

Language:

english

File:

PDF, 646 KB

english, 1994

5

SPIE Proceedings [SPIE 16th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 18 September 1996)] 16th Annual BACUS Symposium on Photomask Technology and Management - Patterning of membrane masks for projection e-beam lithography

Fetter, Linus A., Biddick, Christopher J., Blakey, Myrtle I., Liddle, James A., Peabody, Jr., Milton L., Novembre, Anthony E., Tennant, Donald M., Shelden, Gilbert V., Reynolds, James A.

Year:

1996

Language:

english

File:

PDF, 661 KB

english, 1996

6

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Printability of substrate and absorber defects on extreme ultraviolet lithographic masks

Nguyen, Khanh B., Ray-Chaudhuri, Avijit K., Tichenor, Daniel A., Stulen, Richard H., Nissen, Rodney P., Berger, Kurt W., Paul, Phillip H., Tennant, Donald M., Fetter, Linus A., Windt, David L., Bjorkh

Year:

1995

Language:

english

File:

PDF, 579 KB

english, 1995

7

SPIE Proceedings [SPIE Biomedical Optics (BiOS) 2008 - San Jose, CA (Saturday 19 January 2008)] Single Molecule Spectroscopy and Imaging - Fluorescence enhancement on silver nanostructures: studies of components of ribosomal translation in vitro

Mandecki, Wlodek, Enderlein, Jörg, Gryczynski, Zygmunt K., Bharill, Shashank, Borejdo, Julian, Erdmann, Rainer, Cabral, Diana, Cooperman, Barry S., Farrell, Ian, Fetter, Linus, Goldman, Emanuel, Grycz

Year:

2008

Language:

english

File:

PDF, 901 KB

english, 2008

8

Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.

Novembre, Anthony E., Tarascon, Regine G., Berger, Steven D., Biddick, Chris J., Blakey, Myrtle I., Bolan, Kevin J., Fetter, Linus A., Harriott, Lloyd R., Huggins, Harold A., Knurek, Chester S., Liddl

Journal:

Journal of Photopolymer Science and Technology

Year:

1996

Language:

english

File:

PDF, 556 KB

english, 1996

9

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Electron-beam and x-ray lithographic characteristics of the optical resist ARCH

Novembre, Anthony E., Tarascon-Auriol, Regine G., Nalamasu, Omkaram, Fetter, Linus A., Bolan, Kevin J., Knurek, Chester S., Muenzel, Norbert, Holzwarth, Heinz E., Warlaumont, John M.

Year:

1995

Language:

english

File:

PDF, 281 KB

english, 1995

10

SPIE Proceedings [SPIE Microtechnologies for the New Millennium 2003 - Maspalomas, Gran Canaria, Canary Islands, Spain (Monday 19 May 2003)] Smart Sensors, Actuators, and MEMS - MEMS mirror array for a wavelength-selective 1xK switch

Lopez, Daniel O., Pardo, Flavio, Aksyuk, Vladimir A., Simon, M. E., Shea, Herbert R., Marom, Dan M., Neilson, David T., Cirelli, Raymond A., Klemens, Fred P., Mansfield, William M., Fetter, Linus A.,

Year:

2003

Language:

english

File:

PDF, 424 KB

english, 2003

11

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool

Nguyen, Khanh B., Tichenor, Daniel A., Berger, Kurt W., Ray-Chaudhuri, Avijit K., Haney, Steven J., Nissen, Rodney P., Perras, Yon E., Arling, Richard W., Stulen, Richard H., Fetter, Linus A., Tennant

Year:

1996

Language:

english

File:

PDF, 563 KB

english, 1996

12

SPIE Proceedings [SPIE Optics East - Philadelphia, PA (Monday 25 October 2004)] Nanofabrication: Technologies, Devices, and Applications - Properties of ZnO nanotips selectively grown by MOCVD

Chen, Hanhong, Lai, Warren Y., Pau, Stanley, Zhong, Jian, Saraf, Gaurav, Lopez, O. Daniel, Zhang, Zheng, Lu, Yicheng, Fetter, Linus A., Pai, Chien-Shing

Year:

2004

Language:

english

File:

PDF, 254 KB

english, 2004

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